Name of the Equipment
Plasma Enhanced Chemical Vapor Deposition (PECVD) (Hind High Vacuum Make)
Equipment Image
Faculty Incharge
Dr. Arun Kumar Singh
Description
Wide variety of material growth including high-k dielectrics , Capable of processing 4” substrate holder with heating up to 300⁰C, Processing at vacuum of 1x10-3 Torr, Fully automatic operation control using HMI
Location
Semiconductor Research Centre
Status of Equipment
Working
Purchased from Institute fund/ Project grant/ others
DST-FIST
Department
Electronics & Communication Engineering