Name of the Equipment
Mask Aligner- UV (405/365nm) ABM/6/350/NUV/SFM/M)
Equipment Image
Faculty Incharge
Dr. Arun Kumar Singh
Description
Ability to do patterning /lithography with semi-automatic capability.Minimum feature size of 0.8um and handle substrates upto 3 inch diameter. Ability to process mask sizes from 2.5”*2.5”upto 5”*5”.Split- field dual CCD camera with continuos video zoom with magnification upto 900
Maximum rotational speed 12000 rpm, Can store up to 30 recipes in internal memo-ry with unlimit-ed storage via USB drive
Location
Semiconductor Research Centre
Status of Equipment
Working
Purchased from Institute fund/ Project grant/ others
DST-FIST
Department
Electronics & Communication Engineering