Faculty Name | Department | Title |
---|---|---|
Deepak Kumar Sharma | Electronics and Communication Engineering | Deepak K. Sharma, Robin Khosla, Satinder K Sharma “High performance Au/PZT/TiOxNy/Si MFIS structure for next generation ferroelectric memory applications” AIP Conference Proceedings, vol.1661, pp. 060007, 2014 |
Deepak Kumar Sharma | Electronics and Communication Engineering | S. Singh, Deepak Kumar Sharma et al. Design and development of broadband DC-10 GHz packaged RF MEMS switches with on chip CPW-microstrip transitions. Sadhana, Springer, vol. 47, 65, 2022 |
Deepak Kumar Sharma | Electronics and Communication Engineering | J John, Deepak Kumar Sharma et. al. “Instrument for Lunar Seismic Activity Studies on Chandrayaan-2 Lander” Current Science, vol. 118, Issue 3, pp. 00113891, 2020 |
Deepak Kumar Sharma | Electronics and Communication Engineering | Anitha B, Deepak Kumar Sharma et. al. “Computational study on ion dynamics of MEMS quadrupole mass filter” Manufacturing Technology Today, vol. 18, Issue. 10, 2020 |
Deepak Kumar Sharma | Electronics and Communication Engineering | Deepak Kumar Sharma, Arnab Datta “Oxide Edge Trap Density Extraction in Silicon Nanowire MOSFET from Tunnel Current Noise Measurement in Gated Diode like Arrangement” IEEE Transactions on Device and Materials Reliability, vol. 20, Issue 3, pp. 512 – 516, 2020 |
Deepak Kumar Sharma | Electronics and Communication Engineering | Deepak Kumar Sharma, Arnab Datta “Impact of Varying Strain Energy in Oxide on Random Telegraph Noise and Associated Time Constants in Silicon Nanowire pMOSFETs” IEEE Transactions on Electron Devices, vol. 66, Issue 3, pp. 1489 – 1494, 2019 |
Deepak Kumar Sharma | Electronics and Communication Engineering | Deepak K. Sharma, Ranjith Kumar Goud, Arnab Datta, Sanjeev Manhas “Field Stress Influenced Conduction Behavior of Narrow Diameter Gate-All-Around (GAA) Silicon Nanowire n-MOSFET” IEEE/TMS Journal of Electronic Materials, vol 48, Issue 12, pp 7674-7679, 2019 |
Deepak Kumar Sharma | Electronics and Communication Engineering | Amit Chauhan, Deepak K. Sharma, Arnab Datta “Rate limited filament formation in Al-ZnO-Al bipolar ReRAM cells and its impact on early current window closure during cycling” Journal of Applied Physics, AIP, vol. 125, pp. 104503, 2019 |
Deepak Kumar Sharma | Electronics and Communication Engineering | Deepak K. Sharma, Robin Khosla, Satinder K Sharma” Multilevel metal/Pb (Zr0.52Ti0.48) O3/TiOxNy/Si for next generation FeRAM technology node” Solid-State Electronics, vol. 111, pp. 42-46, 2015 |
Deepak Kumar Sharma | Electronics and Communication Engineering | Robin Khosla, Deepak K. Sharma, Kunal Mondal, Satinder K Sharma “Effect of electrical stress on Au/Pb(Zr0.52Ti0.48)O3/TiOxNy/Si gate stack for reliability analysis of ferroelectric field effect transistors” Applied Physics Letters, vol. 105, Issue 15, pp. 152907, 2014 |